nanoimprintlitografi

Nanoimprint lithography, often abbreviated as NIL, is a high-resolution patterning technique used in nanotechnology. It works by physically deforming a resist material on a substrate using a patterned mold or stamp. This process creates a relief pattern on the resist that can then be transferred to the underlying substrate through subsequent etching or deposition steps. NIL is considered a low-cost, high-throughput alternative to traditional photolithography, especially for achieving sub-100 nanometer feature sizes.

The basic principle involves bringing a mold with a desired pattern into contact with a resist layer, typically a polymer, that has been applied to a substrate. Pressure is applied, causing the resist to flow into the recessed areas of the mold and be displaced from the raised areas. After the imprint step, the resist is usually cured, often by UV light or heat, to solidify the imprinted pattern. The mold is then separated from the substrate, leaving the patterned resist behind.

There are several variations of NIL, including soft lithography which uses elastomeric stamps, and hard imprint lithography which employs rigid molds. Template transfer is another important aspect, where the pattern from the mold is transferred to the substrate itself. This can be achieved through processes like etching, where the resist acts as a mask, or by depositing material into the imprinted cavities. NIL has applications in various fields, including the fabrication of optical components, electronic devices, and biosensors, due to its ability to create intricate nanoscale patterns.