höyrystyminenPVD

HöyrystyminenPVD, or evaporative physical vapor deposition, is a method within the physical vapor deposition family in which the source material is heated in vacuum until it enters the vapor phase and then condenses on a substrate to form a thin film. The technique relies on a high vacuum to minimize gas-phase collisions and impurities, producing relatively pure coatings.

Common implementations are thermal evaporation (resistive heating of a crucible or boat), electron-beam evaporation, and, less commonly, laser-assisted evaporation. In thermal evaporation, the source material is heated by electrical resistance or induction; the resulting vapor travels to the substrate in a predominantly line-of-sight trajectory. Deposition temperatures and flux control film thickness and microstructure. Base pressures are typically 10^-6 to 10^-7 Torr (lower for some e-beam systems), with deposition rates ranging from about 0.1 to several tens of nanometers per second.

Materials suited to höyrystyminenPVD include metals, some oxides and nitrides via reactive evaporation, and certain polymers to a limited extent. Films are usually dense and chemically pure, but the method is highly directional, which can hinder coating conformality on complex geometries. Substrate temperature and post-deposition annealing influence crystallinity and residual stress.

Applications span optical coatings (antireflection coatings and mirrors), protective and decorative metal coatings, and certain hard coatings such as metal oxides or nitrides. Compared with other PVD methods like sputtering, höyrystyminenPVD generally offers simpler equipment and high film purity but lower conformality on complex topographies and slower deposition for some materials.