Tyhjiöpinnoitusmenetelmät
Tyhjiöpinnoitus, also known as vacuum coating, is a broad term for a group of processes used to deposit thin films onto a substrate within a vacuum environment. These films can range in thickness from a few nanometers to several micrometers and are applied to alter the surface properties of the substrate. The vacuum is crucial for these processes because it prevents the vaporized material from reacting with air molecules and allows for a clean, controlled deposition.
There are several primary types of tyhjiöpinnoitus. Physical vapor deposition (PVD) involves the physical transfer of
Tyhjiöpinnoitus is employed across a wide array of industries and applications. It is used to enhance hardness