Ti7O13
Ti7O13, also known as titanium suboxide, is a non-stoichiometric compound of titanium and oxygen with a variable composition typically represented as TiOx, where x ranges between approximately 1.08 and 1.25. This material is notable for its metallic conductivity and high melting point, making it useful in specialized applications.
The structure of Ti7O13 belongs to the M-type titanium suboxides, characterized by a complex crystal lattice.
Ti7O13 is often synthesized through chemical vapor deposition (CVD) or reactive sputtering techniques, where titanium and
Applications of Ti7O13 include use as a diffusion barrier in semiconductor manufacturing, where its stability and
Despite its potential, Ti7O13 remains less common than stoichiometric titanium oxides due to its synthesis complexity