Plasmaprocessing
Plasmaprocessing refers to a set of techniques that use plasma, an ionized gas, to modify surfaces or to deposit coatings on materials. In processing, reactive ions, radicals and energetic particles drive chemical and physical reactions at or near the surface, enabling cleaning, etching, activation, or film formation with typically low bulk heating of the substrate.
Plasma sources and configurations vary. Low‑pressure plasmas are generated in vacuum by discharge methods such as
Common processing steps include cleaning and surface preparation, where oxygen plasmas remove organics and other reactive
Applications span semiconductor and microelectronics fabrication, optics and protective coatings, biomedical devices, textiles, and automotive or
Key considerations include equipment cost and complexity, process control and repeatability, potential ion‑induced damage or contamination,