Tyhjiökehitys
Tyhjiökehitys, also known as vacuum development, is a term used in the field of optics and material science to describe the process of depositing thin films onto a substrate within a vacuum chamber. This technique is essential for creating optical coatings with precise properties, such as anti-reflective layers, filters, and mirrors. The vacuum environment is crucial because it prevents contamination of the substrate and the deposited material by atmospheric gases or particles, ensuring the purity and uniformity of the thin film.
There are several methods employed in tyhjiökehitys, including physical vapor deposition (PVD) and chemical vapor deposition
The precise control over parameters such as temperature, pressure, deposition rate, and gas composition within the