ThSi2

Thorium silicide, with the chemical formula ThSi2, is an intermetallic compound composed of thorium and silicon. It is one of several thorium silicides, with other stoichiometries also known. ThSi2 crystallizes in the tetragonal crystal system. Its physical properties include a relatively high melting point and good thermal stability, characteristic of many refractory silicides.

The synthesis of thorium silicide can be achieved through various methods, commonly involving the direct reaction of elemental thorium and silicon at elevated temperatures, often in a vacuum or inert atmosphere to prevent oxidation. Arc melting or induction melting are typical techniques employed for its preparation.

Thorium silicide has been investigated for its potential applications in high-temperature materials and as a component in certain nuclear fuel cycles due to the presence of thorium, a fertile radioactive element. However, its widespread commercial use is limited by factors such as cost, the radioactivity of thorium, and the availability of alternative materials. Research continues to explore its fundamental properties and potential niche applications.