Elektronilitografia

Elektronilitografia, often shortened to e-beam lithography, is a high-resolution patterning technique used in scientific research and semiconductor manufacturing. It utilizes a focused beam of electrons to draw intricate designs onto a substrate coated with an electron-sensitive material, known as a resist.

The process begins with the application of the resist to the substrate. This resist undergoes a change in its chemical properties when exposed to the electron beam. The electron beam is precisely controlled by a computer, allowing for the creation of extremely fine features, often on the nanometer scale. After exposure, the substrate is developed, which selectively removes either the exposed or unexposed portions of the resist, leaving behind a patterned layer. This patterned resist then acts as a mask for subsequent fabrication steps, such as etching or material deposition.

Elektronilitografia is distinguished by its ability to achieve resolutions far beyond optical lithography. This makes it indispensable for research in areas like nanotechnology, quantum devices, and advanced semiconductor R&D. However, its sequential writing process, where the beam scans point by point, makes it a relatively slow technique, limiting its widespread use in high-volume manufacturing. Despite this, its unparalleled resolution continues to make it a critical tool for cutting-edge technological development.