microfabricate

Microfabricate refers to processes used to create miniaturized structures and devices on substrates such as silicon wafers, with feature sizes ranging from micrometers to tens of nanometers. It is a core capability of the semiconductor industry and related fields, enabling devices such as integrated circuits, microelectromechanical systems (MEMS), and microfluidic chips.

Key techniques include lithography to pattern materials, deposition to build layers, and etching to remove material. Lithography ranges from photolithography for large areas to electron-beam or nanoimprint methods for finer features. Deposition methods include chemical vapor deposition, physical vapor deposition, and atomic layer deposition. Etching can be wet or dry, such as reactive ion etching. Planarization and surface conditioning are common steps, and materials include silicon, silicon dioxide, silicon nitride, metals, polymers, and compound semiconductors.

Process flow typically starts with substrate cleaning, followed by deposition of an initial layer, patterning with a resist, pattern transfer by etching or lift-off, additional material deposition, and final passivation. In MEMS fabrication, sacrificial layers may be released to free moving parts.

Applications span computing, sensing, and bioengineering, including integrated circuits, MEMS sensors and actuators, microfluidic devices, and on-chip optics. The field relies on cleanroom environments, process control, and defect management, and continues to pursue smaller features, new materials, and alternative patterning techniques. Key challenges include defect control, uniformity across wafers, alignment accuracy, and high equipment costs.