magnetroniplasmaa
Magnetron plasma refers to a high-density plasma generated in a magnetron discharge, most commonly in sputtering and plasma-processing systems. It is produced when a neutral gas, typically argon, is ionized in the presence of a strong magnetic field applied near a cathode, creating conditions that sustain the plasma near the target surface.
The key physical effect is the crossed electric and magnetic fields. The electric field accelerates electrons
Configurations include DC and RF magnetron discharges. Permanent magnets are arranged behind the target to form
Plasma properties include high density (about 10^18–10^19 m^-3 in many sputtering conditions), moderate electron temperature (a
Applications mainly lie in thin-film deposition and surface modification, notably magnetron sputtering of metals, nitrides, carbides,