Ventrikkeldrain

Ventrikkeldrain is a neurosurgical device used to drain cerebrospinal fluid (CSF) from the brain's ventricular system. In many contexts the term is used interchangeably with external ventricular drain (EVD) or ventricular catheter systems. The primary purpose is to lower elevated intracranial pressure and to manage hydrocephalus, intraventricular hemorrhage, or cerebral edema after injury or surgery.

Design and components: It typically consists of a small-bore catheter inserted through a burr hole into a lateral ventricle, a connection to a drainage system, and a collection reservoir or bag. Modern systems may include programmable valves to regulate drainage and anti-siphon devices to prevent overdrainage. Drainage can be gravity-driven or driven by a controllable vacuum/pressure gradient, depending on the system.

Procedure and management: Placement is a neurosurgical procedure performed under sterile conditions, often with image guidance. After placement, CSF is drained to a target level, and daily measurements of CSF pressure and content may be performed. The drain remains in place until intracranial dynamics stabilize, after which the catheter is removed.

Risks and complications: Potential complications include infection (ventriculitis or meningitis), catheter occlusion, misplacement, intracranial hemorrhage, overdrainage causing subdural collections, and programming errors.

History and variants: The ventrikkeldrain concept predates many modern shunt systems and is commonly used in acute care settings. Related devices include ventriculoperitoneal and ventriculoatrial shunts, which provide longer-term CSF diversion.