Fotorõhkeid
Fotorõhkeid, also known as photoresist or resist, is a light-sensitive material used in photolithography to form a patterned coating. It is a key component in processes that create micro- or nanostructures on a substrate, most commonly in the semiconductor industry for manufacturing integrated circuits.
There are two main types of fotorõhkeid: positive and negative. With a positive fotorõhkeid, the areas exposed
The process typically involves coating a substrate with fotorõhkeid, exposing it to patterned light through a