Fotoresistit

Fotoresistit, also known as photoresist, is a light-sensitive material used in various processes, including photolithography and photoengraving, to form light-impermeable patterns on surfaces. It is primarily used in the manufacturing of microelectronic components, such as integrated circuits and printed circuit boards, as well as in the production of flat-panel displays and microelectromechanical systems (MEMS).

The material is typically applied as a thin layer to a substrate, such as a silicon wafer or a glass plate, and then exposed to light through a patterned mask. The light causes chemical changes in the photoresist, altering its solubility. Depending on the type of photoresist used, either the exposed or the unexposed areas become soluble. The soluble areas are then washed away with a developer solution, leaving behind a patterned layer of photoresist that can be used to transfer the pattern to the underlying substrate through etching or other processes.

There are two main types of photoresist: positive and negative. Positive photoresist becomes soluble when exposed to light, while negative photoresist becomes insoluble. The choice between the two depends on the specific application and the desired pattern. Photoresist materials can be further categorized based on their chemical composition, such as diazonaphthoquinone (DNQ) based, chemically amplified, or non-chemically amplified resists.

The development of photoresist technology has been crucial in the advancement of microfabrication techniques, enabling the creation of increasingly smaller and more complex electronic devices. As technology continues to evolve, the demand for high-resolution, high-performance photoresists is expected to grow, driving further innovation in this field.