Fotolitográfiát

Fotolitográfiát is a Hungarian term referring to photolithography, a fundamental process in microfabrication. It is a technique used to transfer a patterned design onto a substrate, typically a silicon wafer, using light. This process is crucial for creating integrated circuits (ICs), microelectromechanical systems (MEMS), and other micro-scale devices.

The core principle involves using a light-sensitive material called a photoresist. This resist is coated onto the substrate. A mask, which contains the desired pattern, is then placed between a light source and the photoresist-covered substrate. When light shines through the mask, it selectively exposes certain areas of the photoresist. The exposed areas (or unexposed areas, depending on whether it's a positive or negative photoresist) become soluble in a developing solution.

After development, the patterned photoresist remains on the substrate, acting as a stencil. Subsequent steps, such as etching or deposition, can then be performed. Etching removes material from the areas not protected by the photoresist, while deposition adds new material onto the exposed areas. Once the patterning is complete, the remaining photoresist is stripped away, leaving the desired micro-structure on the substrate. Photolithography is a highly precise process, enabling the creation of features on the nanometer scale. It is a cyclical process, often repeated many times with different masks to build up complex, multi-layered structures.