FIBID

FIBID, or Focused Ion Beam Induced Deposition, is a nanofabrication technique that uses a focused ion beam to locally decompose a gaseous precursor and deposit material on a substrate. It is a direct-write method within the broader family of ion-beam induced deposition, and it is commonly contrasted with Focused Electron Beam Induced Deposition (FEBID).

In operation, a gas injection system delivers precursor molecules to the region near the beam interaction point. A focused ion beam, typically gallium ions from a liquid metal ion source, irradiates the surface. The ion impact dissociates the adsorbed precursor, producing non-volatile fragments that form a solid deposit on the surface while volatile byproducts are pumped away. Deposits grow where the beam irradiates, enabling three-dimensional nanostructures with careful control of dwell time and beam path.

Materials deposited by FIBID can include metals such as platinum, tungsten, and palladium from organometallic precursors, as well as carbon-rich deposits depending on the precursor. Common Pt deposits use precursors like MeCpPtMe3. However, the deposits often contain significant carbon and other impurities, and gallium implantation can alter the material’s properties. The technique can achieve nanoscale features, with lateral resolution typically tens of nanometers, but is limited by beam scattering and precursor chemistry.

Applications include direct-write fabrication of nanoscale contacts, wiring, masks, and microelectromechanical components, as well as rapid prototyping and repair of circuits. Limitations include material purity concerns, potential ion-induced damage, relatively slow deposition rates, and the need for post-deposition treatment to improve conductivity or crystallinity.

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