ohutkalvopäällystys
Ohutkalvopäällystys, often translated as thin-film coating, refers to a process where a thin layer of material is deposited onto a substrate to alter its surface properties. These coatings can range in thickness from a few nanometers to several micrometers. The primary goal of applying a thin-film coating is to enhance the performance, durability, or aesthetics of the underlying material.
Various methods are employed for ohutkalvopäällystys, including physical vapor deposition (PVD) and chemical vapor deposition (CVD).
The materials used for ohutkalvopäällystys are diverse and can include metals, ceramics, polymers, and composite materials.
Applications of ohutkalvopäällystys are widespread across numerous industries. In electronics, they are essential for creating conductive