immersionlithography
Immersion lithography is an advanced semiconductor manufacturing technique used to print ever-smaller features onto silicon wafers. It builds upon conventional photolithography by introducing a liquid, typically ultrapure water, between the projection lens and the wafer. This liquid has a higher refractive index than air, which allows the lithography system to use shorter wavelengths of light more effectively.
The principle behind immersion lithography is related to optics. When light passes from one medium to another
The process involves carefully depositing a thin layer of the immersion fluid onto the wafer surface. The
Immersion lithography has been crucial in extending the capabilities of optical lithography beyond the diffraction limit