fotolitográfiával

Fotolitográfia is a photolithographic process used in microfabrication, particularly in the semiconductor industry. It is a key technique for creating intricate patterns on semiconductor wafers, which are the foundation for integrated circuits (microchips). The process involves using light to transfer a geometric pattern from a photomask to a light-sensitive chemical called a photoresist, coated onto a substrate.

The core steps of fotolitográfia typically include cleaning the substrate, applying the photoresist layer, aligning the photomask, exposing the photoresist to ultraviolet light through the mask, developing the photoresist to remove either the exposed or unexposed areas, and finally etching the substrate to transfer the pattern. The choice of photoresist and the wavelength of light used are crucial for achieving the desired resolution and feature size.

Fotolitográfia allows for the mass production of complex electronic components with extremely small features, measured in nanometers. This precision is essential for the miniaturization and increased performance of modern electronic devices. Different types of fotolitográfia exist, including immersion lithography and extreme ultraviolet (EUV) lithography, which enable even smaller feature sizes and higher resolutions. The ongoing development of lithographic techniques is a driving force behind advancements in computing power and the ever-expanding capabilities of electronic technology.