epitaksialmenetelmillä
Epitaksialmenetelmillä, known in English as epitaxial methods, refers to a group of techniques used in materials science and semiconductor manufacturing to grow thin films of crystalline material on a substrate, where the deposited film's crystal lattice structure aligns with that of the substrate. This ordered growth is crucial for creating functional electronic and optical devices. The key principle is that the deposited material, the 'epilayer', mimics the crystallographic orientation of the underlying 'substrate'.
There are several primary epitaxial methods. Vapor-phase epitaxy (VPE) involves chemical reactions of gaseous precursors that
The successful application of epitaxial methods requires careful selection of substrate and epilayer materials with compatible