Materialplume
Materialplume is a conceptual term used in materials science to describe the spatial and temporal distribution of material ejected from a target or substrate during high-energy deposition and processing techniques. The term encompasses the plume's shape, composition, velocity distribution, and interaction with the surrounding environment, all of which influence coating uniformity and growth kinetics.
The concept arose in studies of laser ablation, sputtering, and related deposition methods, where a short, intense
Theoretical treatments of a materialplume combine fluid dynamics, plasma physics, and thermodynamics. Models typically consider the
Applications of materialplume analysis include optimizing coating thickness nonuniformities, tailoring microstructures, and interpreting time-resolved diagnostic measurements.
Relation to related concepts such as ablation plume, sputtering plume, and plume dynamics is common. Differences
See also: pulsed laser deposition, sputtering, plume dynamics, thin-film growth.