H3SiSiSiH3

H3SiSiSiH3, commonly referred to as trisilane or Si3H8, is a linear organosilicon hydride in the silane family. Its molecule consists of three silicon atoms in a row, with the two terminal silicon atoms bonded to three hydrogen atoms each, and the central silicon bearing two hydrogens, giving the formula Si3H8. In this arrangement the molecule has two Si–Si single bonds and a roughly linear geometry in the gas phase.

Synthesis and handling: Trisilane is typically prepared and handled under inert atmosphere due to its reactivity and tendency to decompose or ignite in air. It can be generated in situ from higher silane hydrides by controlled cleavage or disproportionation under catalytic or photochemical conditions, and is often collected and stored in sealed, inert environments.

Reactions and properties: Trisilane is a volatile, reactive silane derivative. It decomposes thermally or photochemically to yield silicon-containing fragments and hydrogen, and can participate in radical and hydrosilylation reactions. It serves as a source of silicon for the chemical vapor deposition of silicon-containing materials and nanostructures, or as a precursor in the preparation of silicon hydride materials.

Applications: In research and industry, Si3H8 acts as a silicon source for depositing silicon or silicon-containing films and nanoparticles. It is used in studies of silicon cluster chemistry and in the development of low-temperature deposition techniques.

Safety: As with other silanes, trisilane is flammable and can be pyrophoric in air. It is handled under inert gas, away from oxidizers, with appropriate gas handling and ventilation to avoid exposure to vapors.