Félvezetdiffúzióban
Félvezetdiffúzióban refers to the process of diffusion within semiconductors. This phenomenon is crucial for altering the electrical properties of semiconductor materials by introducing impurity atoms, also known as dopants, into their crystal lattice. Diffusion is a fundamental technique used in semiconductor fabrication to create p-n junctions, which are the building blocks of transistors, diodes, and integrated circuits.
The process relies on the principle of diffusion, where particles move from a region of higher concentration
There are two primary methods for achieving diffusion: predeposition and drive-in. In predeposition, a high concentration