Fotorezist

Fotorezist, also known as photoresist, is a light-sensitive material used in the manufacturing of microchips, printed circuit boards, and other precision components. It plays a crucial role in the photolithography process, which is a key step in the fabrication of semiconductor devices and other micro-scale structures.

Photorezists are typically applied as a thin layer onto a substrate, such as a silicon wafer or a printed circuit board. The material is designed to change its solubility properties when exposed to light, usually ultraviolet (UV) light. There are two main types of photoresists: positive and negative.

Positive photoresists become soluble in a developer solution after exposure to light, allowing the exposed areas to be removed. This is useful for creating patterns where the light is blocked by a mask. Negative photoresists, on the other hand, become insoluble after exposure to light, meaning the exposed areas remain intact while the unexposed areas are removed. This is beneficial for applications where the pattern is defined by the light itself.

The choice of photoresist depends on various factors, including the desired resolution, the type of substrate, and the specific application. Photoresists are available in different forms, such as liquid, spin-on, and dry film, each suited for different manufacturing processes.

In summary, fotorezist is an essential material in the field of microfabrication, enabling the precise creation of intricate patterns and structures at the micro and nano scales. Its light-sensitive properties make it a versatile tool in the production of advanced electronic and optical devices.