Fotolitografisk

Fotolitografisk is a term derived from Swedish, combining "foto" (photo, relating to light) and "litografisk" (lithographic, relating to lithography). In its most common context, it refers to photolithography, a process used in microfabrication, particularly in the semiconductor industry.

Photolithography is a key step in the manufacturing of integrated circuits (ICs), also known as microchips. It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical called a photoresist on a substrate, typically a silicon wafer. The process involves several stages. First, a layer of photoresist is applied to the wafer. Then, a photomask, which contains the desired circuit pattern, is placed above the wafer. Light is shone through the photomask, exposing specific areas of the photoresist. After exposure, the wafer is developed, which either removes the exposed photoresist (positive photoresist) or the unexposed photoresist (negative photoresist), leaving behind the pattern. This pattern then acts as a mask for subsequent processing steps, such as etching or deposition, to create the intricate structures of electronic components.

The precision and resolution of photolithography are critical for determining the density and performance of microchips. Advances in light sources (e.g., ultraviolet, extreme ultraviolet) and mask technologies have enabled the creation of ever smaller and more complex circuits. While its primary application is in semiconductor manufacturing, photolithographic principles are also applied in other fields requiring precise patterning, such as in the production of flat-panel displays and microelectromechanical systems (MEMS).