Dampfasegroei

Dampfasegroei, also known as vapor-phase growth, refers to a set of techniques used to deposit thin films onto a substrate from a gaseous phase. This process involves transporting precursor materials in a vapor state to the substrate surface, where they react or decompose to form a solid film. Several methods fall under the umbrella of vapor-phase growth, each with its own specific advantages and applications.

Chemical Vapor Deposition (CVD) is a widely used technique where volatile precursor compounds react chemically on or near the heated substrate surface, forming the desired solid film. Physical Vapor Deposition (PVD) methods, on the other hand, involve the physical transfer of material from a source to the substrate in a vapor form, without chemical reactions being the primary mechanism for film formation. Examples of PVD include sputtering and evaporation.

The choice of vapor-phase growth technique depends on factors such as the material to be deposited, the desired film properties, the substrate material, and the required film thickness and uniformity. These methods are crucial in the fabrication of a wide range of electronic devices, optical coatings, protective layers, and various advanced materials. The precise control over deposition parameters in vapor-phase growth allows for the creation of highly controlled and specialized thin films.