Atomlage

Atomlage, also known as atomic layer deposition (ALD), is a chemical vapor deposition (CVD) method used to produce high-quality, conformal thin films. It is particularly valued for its ability to deposit materials with precise control over thickness, uniformity, and composition. The process involves the sequential exposure of a substrate to two or more precursor gases, each of which reacts with the surface to form a monolayer of the desired material. This self-limiting reaction ensures that the film grows uniformly, even on complex surfaces with high aspect ratios. Atomlage is widely used in the semiconductor industry for the deposition of gate dielectrics, barrier layers, and other critical components in advanced electronic devices. Its advantages include excellent step coverage, high purity, and the ability to deposit materials at relatively low temperatures, making it compatible with temperature-sensitive substrates. However, the process can be slow and requires careful control of precursor delivery and reaction conditions to achieve optimal results.