Atomikerrosjäl

Atomikerrosjäl is a Finnish term that translates to "atomic layer deposition" in English. It refers to a specialized chemical vapor deposition technique used to deposit thin films onto a substrate. Unlike conventional deposition methods, atomic layer deposition (ALD) operates on a self-limiting process. This means that each deposition cycle consists of sequential, self-limiting surface reactions.

The core principle of ALD involves introducing precursor gases one at a time into a reaction chamber. Each precursor reacts with the substrate surface in a controlled manner until saturation is reached, meaning no more precursor molecules can adsorb or react. After the first precursor is purged from the chamber, the second precursor is introduced. This second precursor reacts with the first precursor layer, forming the desired thin film material. This process is repeated for many cycles, allowing for precise control over the film thickness, often down to a single atomic layer.

ALD is highly valued for its ability to produce conformal films with exceptional thickness uniformity and conformality, even on complex three-dimensional structures and in high aspect ratio features. This makes it indispensable in various advanced technological fields. Applications include semiconductor manufacturing for gate dielectrics and barrier layers, optics for anti-reflective coatings, catalysis for creating high-surface-area catalysts, and energy storage for improving battery electrode performance. The precise control and conformal nature of ALD films are crucial for the performance and miniaturization of modern electronic devices and other advanced materials.