trifluoromethanesulfonic

Trifluoromethane, also known as fluoroform, is a fluorinated methane with the chemical formula CHF3. It is a colorless, nonflammable gas at room temperature. In industry, CHF3 is produced as a feedstock for fluorinated compounds and is also used as a refrigerant and as a plasma etchant gas in semiconductor manufacturing.

Applications and uses include plasma etching of silicon and other materials in the fabrication of integrated circuits, as well as a refrigerant in low-temperature cooling systems under the designation R-23. It also serves as an intermediate in the production of fluoropolymers and other specialty fluorinated chemicals.

Production and handling involve fluorination processes that convert methane or chlorinated fluorocarbons into CHF3. It can be released during synthesis, processing, and use, and is typically managed within controlled systems to minimize emissions. CHF3 is characterized by long atmospheric residence and is considered a potent greenhouse gas when released to the atmosphere.

Environmental impact and regulation: CHF3 has a high global warming potential and a long atmospheric lifetime, contributing to climate change when emitted. It has near-zero ozone depletion potential, but its emissions are subject to regulatory controls under climate and environmental protection regimes, with emphasis on containment, recovery, and phasedown in many regions.

Safety: CHF3 is largely non-toxic and nonflammable, but as a gas it can displace oxygen and pose an asphyxiation risk in confined spaces. Standard industrial hygiene practices, proper ventilation, and leak detection are important in workplaces handling trifluoromethane.