plasmasädeprosessit
Plasma deposition processes, also known as plasmadeponering or plasmalegering, are techniques used to deposit thin films of material onto a substrate using plasma. Plasma is an ionized gas containing ions, electrons, and neutral particles, which can be generated in various ways, such as by electrical discharge or microwave radiation. In plasma deposition, the precursor materials are introduced into the plasma, where they are dissociated and ionized. These activated species then react on the substrate surface to form a thin film.
Several types of plasma deposition processes exist, including plasma-enhanced chemical vapor deposition (PECVD) and physical vapor
The advantages of plasma deposition processes include the ability to deposit a wide range of materials, including