photoCVD

PhotoCVD, or Photochemical Vapor Deposition, is a chemical vapor deposition (CVD) technique that utilizes light to initiate the deposition process. This method is particularly useful for depositing thin films of materials that are sensitive to heat or require precise control over their deposition conditions. In photoCVD, a precursor gas is introduced into a reaction chamber, where it is exposed to ultraviolet (UV) light. The UV light photolyzes the precursor gas, breaking it down into reactive species that then deposit onto a substrate to form a thin film. The wavelength and intensity of the UV light can be controlled to tailor the deposition process, allowing for the deposition of various materials, including polymers, metals, and ceramics. PhotoCVD offers several advantages over traditional CVD methods, such as lower substrate temperatures and the ability to deposit materials with complex structures. However, it also has limitations, including the need for specialized UV light sources and the potential for photodegradation of the deposited films. Despite these challenges, photoCVD remains a valuable tool in the field of materials science and engineering, enabling the fabrication of advanced thin films for a wide range of applications.