metalsilicon

Metalsilicon is a term used for metal silicides, compounds formed by combining silicon with metals, and sometimes for silicon-containing metal alloys. The most common silicides have formulas such as MSi2 or MSi, with M representing metals like Ti, Co, Ni, Fe, W, or Mo. These compounds span a range of electrical and thermal behaviors, from metallic conductors to semiconductors, depending on composition and crystal structure.

Crystal structures vary widely, and silicides can exhibit high melting points and good oxidation resistance in some phases, making them attractive for high-temperature applications. In electronics, silicides such as TiSi2, CoSi2, and NiSi are used as contact materials on silicon chips, providing low-resistance ohmic or Schottky contacts and acting as diffusion barriers.

Preparation methods include direct high-temperature synthesis of metal and silicon, diffusion of silicon into metal substrates, and chemical vapor deposition or reactive vapor deposition to form thin silicide layers. In microelectronics, silicides are often formed in situ by annealing metal contacts on silicon.

Applications extend beyond electronics to high-temperature structural materials, where compounds like MoSi2 and WSi2 (disilicides) offer thermal stability and oxidation resistance. The properties of a given metalsilicon material depend strongly on the metal, the silicon content, and the phase produced.

Safety and handling follow standard practices for metal powders and inorganic compounds. See also metal silicides, silicon.