magnetronisputtaus
Magnetronisputtaus, often referred to as magnetron sputtering, is a physical vapor deposition (PVD) technique used to deposit thin films of material onto a surface. This process involves creating a plasma in a vacuum chamber and then using a magnetic field to confine the plasma close to a target material. The confined plasma then bombards the target, dislodging atoms from its surface. These dislodged atoms travel through the vacuum chamber and deposit onto the substrate, forming a thin film.
The key components of a magnetron sputtering system include a vacuum chamber, a target material, a gas
Magnetron sputtering is a versatile deposition method capable of depositing a wide range of materials, including