magnesiumsilider

Magnesium silicide, with the chemical formula Mg2Si, is an intermetallic compound formed from magnesium and silicon. The term magnesiumsilider is not standard and appears to be a misspelling of magnesium silicide.

Crystal structure and composition: Mg2Si crystallizes in an antifluorite-type structure, typically described as silicon forming a diamond-like lattice with magnesium atoms occupying the tetrahedral interstices. This arrangement gives Mg2Si distinctive electronic and structural properties characteristic of intermetallic semiconductors.

Synthesis: Magnesium silicide is usually prepared by direct high-temperature reaction of elemental magnesium and silicon, typically under inert atmosphere or vacuum. Methods include arc melting or powder metallurgy followed by annealing. The material is reactive with air and moisture, so production and handling are commonly conducted in inert or controlled environments to minimize oxidation.

Properties: Mg2Si is a semiconductor with a moderate band gap and notable thermoelectric performance, particularly in magnesium silicide–based solid solutions and doping variants. It tends to be brittle and can be unstable in air at elevated temperatures. When exposed to water, Mg2Si can hydrolyze to form magnesium hydroxide and silane gas (SiH4), a reaction that poses safety considerations.

Applications and research: The compound has attracted interest for thermoelectric applications, especially as part of Mg2Si1−xGex and related solid solutions for mid-temperature heat-to-electricity conversion. It is also studied as a potential silicon source in specialized semiconductor processing or materials science contexts, though it is not widely used as a bulk commercial material.

Safety and handling: Because Mg2Si reacts with moisture and air, handling is typically done under inert atmosphere. Hydration can release silane, which is pyrophoric and hazardous; appropriate ventilation and protective equipment are required.