lämpöoksidoida

Thermal oxidation, known as lämpöoksidoida in Finnish, is a surface treatment process used to form a thin oxide layer on a metal substrate. This process typically involves exposing the material to an elevated temperature in an oxidizing atmosphere, such as air or oxygen. The heat provides the energy for the oxygen atoms to react with the surface atoms of the metal, creating a protective oxide layer.

The thickness and properties of the oxide layer depend on several factors, including the type of metal, the processing temperature, the duration of the oxidation, and the composition of the oxidizing atmosphere. Common metals that undergo thermal oxidation include aluminum, titanium, and silicon. For silicon, thermal oxidation is a crucial step in semiconductor fabrication, creating a silicon dioxide (SiO2) layer that acts as an electrical insulator and a mask during subsequent processing steps.

The benefits of thermal oxidation include enhanced corrosion resistance, improved wear resistance, and altered electrical or optical properties of the material. The formed oxide layer is often integral to the material, meaning it is not a deposited film but rather a result of the substrate's own atoms reacting with the atmosphere. This can lead to excellent adhesion and durability of the surface modification. The process is relatively straightforward and can be performed in various types of furnaces.