interferentielithografie

Interferentielithografie, also known as interference lithography, is an optical fabrication technique used to create periodic structures. It utilizes the principle of wave interference, specifically the superposition of two or more coherent light beams. When these beams intersect, they form an interference pattern characterized by alternating regions of high and low intensity. This pattern is then transferred to a light-sensitive material, such as a photoresist, which is subsequently processed to reveal the desired periodic structure.

The resolution of interferentielithografie is fundamentally limited by the wavelength of the light used and the numerical aperture of the optical system. Shorter wavelengths and higher numerical apertures enable the creation of finer features. The process typically involves a light source, such as a laser, which is split into multiple beams. These beams are then precisely directed to overlap at the surface of the substrate coated with the resist. The intensity distribution of the interference pattern determines the pattern etched or deposited onto the resist.

Interferentielithografie is particularly well-suited for generating large-area periodic gratings and photonic crystals. These structures find applications in various fields, including optics, photonics, and nanotechnology. Examples include the fabrication of diffractive optical elements, optical sensors, and microfluidic devices. The ability to create precise, repeating patterns over large areas with good uniformity makes it a valuable tool for scientific research and industrial manufacturing.