ellipsometrische
Ellipsometry is an optical technique used to determine the dielectric properties (complex refractive index or dielectric function) of a material. It is based on the principle that the polarization state of light changes upon reflection from a surface. This change is characterized by the ratio of the complex reflection coefficients for light polarized parallel and perpendicular to the plane of incidence, known as the ellipsometric ratio or psi (ψ) and delta (Δ).
Ellipsometry can be performed in various configurations, including null, rotating analyzer, and rotating polarizer. In null
Ellipsometry is widely used in the characterization of thin films, surfaces, and interfaces. It can provide
In recent years, advances in ellipsometry have led to the development of spectroscopic ellipsometry, which measures