TXSELs

TXSEL stands for Transverse Section Excited Laser. It is a type of semiconductor laser device that utilizes a novel pumping scheme to achieve efficient laser operation. Unlike traditional edge-emitting lasers where the active region is pumped from the sides, TXSELs are pumped from the top surface. This transverse excitation allows for a larger excitation volume and potentially higher power output.

The design of a TXSEL typically involves a semiconductor wafer where the laser medium is located beneath the surface. Pumping energy, often in the form of light or electrical current, is applied directly to the top surface, penetrating into the active region. This excitation leads to stimulated emission of photons, which are then amplified within an optical cavity. The output beam is generally emitted from the top surface as well, perpendicular to the wafer plane.

TXSELs offer several advantages, including better thermal management due to the larger excited area and simplified fabrication processes in some configurations. They can be designed for high-power applications and have potential uses in areas such as laser pumping, material processing, and telecommunications. Research in TXSEL technology focuses on improving efficiency, beam quality, and extending their operational range.