Rastertunnelmikroskopie
Rastertunnelmikroskopie, commonly abbreviated as STM, is a surface‑analysis technique that enables imaging and manipulation of conductive materials at the atomic scale. The method relies on quantum tunnelling: when a sharp metallic tip is brought within a few angstroms of a sample surface and a bias voltage is applied, electrons tunnel between tip and sample, creating a measurable current. By maintaining a constant tunnelling current while raster‑scanning the tip across the surface, a topographic map of the electron density is generated.
The concept was first demonstrated in 1981 by Gerd Binnig and Heinrich Rohrer at IBM Zurich, for
STM provides sub‑ångström vertical resolution and lateral resolution of about 0.1 nm, allowing direct observation of individual
The method is limited to conductive or semiconductive samples, and the requirement for an atomically sharp