Plazmakeevitus
Plazmakeevitus, a term derived from Finnish, refers to the process of plasma etching. Plasma etching is a fundamental technique used in microfabrication, particularly in the semiconductor industry, to remove material from a substrate. It utilizes a plasma, an ionized gas, to chemically or physically alter the surface of the material. This process is crucial for creating intricate patterns on semiconductor wafers, such as transistors and integrated circuits.
The plasma is typically generated by exposing a gas, such as a mixture of fluorine or chlorine-containing
Plazmakeevitus offers advantages such as high anisotropy, meaning it can etch vertically with minimal undercutting, which