Ionenunterstützte

Ionenunterstützte is a German term that translates to "ion-assisted" in English. It generally refers to processes where ions play a role in facilitating or enhancing a particular action or phenomenon. This concept finds application in various scientific and technological fields, particularly in materials science and surface modification.

In the context of thin film deposition, ion-assisted deposition involves bombarding the growing film surface with energetic ions. This bombardment can influence the film's microstructure, density, adhesion, and other properties. For example, ion assistance can help to densify porous films, improve their crystallinity, or enhance their resistance to wear and corrosion. The type of ion used, its energy, and the flux are critical parameters that determine the outcome of the process.

Another area where ion assistance is relevant is in surface cleaning and etching. Ion sputtering, a technique that uses ion bombardment to remove material from a surface, is a form of ion-assisted cleaning or etching. This is commonly employed in semiconductor manufacturing and in preparing surfaces for subsequent processing. The removal of contaminants or material can be more efficient and controlled with ion bombardment compared to purely chemical methods.

The term can also extend to other processes where ions are used to trigger or promote a reaction or change. For instance, in some analytical techniques, ion beams might be used to induce specific responses in a sample that are then detected and analyzed. The core idea remains the use of ions as agents to drive a process or alter a material's characteristics.