Höyrynpurkauspinnoitus

Höyrynpurkauspinnoitus, known in English as vapor deposition, is a versatile family of thin-film deposition techniques used in manufacturing and materials science. These methods involve transferring material from a gaseous phase onto a substrate surface, where it condenses to form a solid film. The driving force for deposition can vary, leading to different specific processes.

Common types of vapor deposition include Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD). PVD processes typically involve the physical removal of material from a source, such as evaporation or sputtering, which is then transported as vapor to the substrate. CVD, on the other hand, relies on chemical reactions occurring in the gas phase or on the substrate surface to deposit the desired material.

The resulting thin films can possess a wide range of properties, including enhanced hardness, wear resistance, electrical conductivity, or optical characteristics. Applications for vapor deposition are extensive, spanning industries like microelectronics for creating semiconductor layers, optics for anti-reflective coatings, tool manufacturing for improving cutting edges, and decorative coatings for various products. The precise control over film thickness and composition makes it a crucial technology for producing advanced materials and devices.