Hapetushuuhtelu

Hapetushuuhtelu (Finnish: hapetus = oxidation, huuhtelu = rinsing) is a term used in industrial cleaning to describe a method that combines oxidation with a rinsing step to remove surface contaminants. The phrase reflects a process in which an oxidizing action is applied to the surface, followed by thorough removal of residues by rinsing.

In practice, hapetushuuhtelu is typically performed after a cleaning or etching stage in metal finishing, glass processing, or semiconductor fabrication. An oxidizing solution—such as hydrogen peroxide, peracids, or ozone-containing mixtures—is applied to the surface to oxidize organic residues and certain inorganic contaminants, after which the surface is thoroughly rinsed with deionized water and dried.

The goal is to achieve a clean surface with a controlled oxide layer that can influence adhesion, corrosion resistance, and subsequent coating performance. The exact outcome depends on the substrate material, oxidant chemistry, contact time, temperature, and rinsing regime.

Common substrates include stainless steel, aluminum, copper, glass, and silicon-based wafers. In electronics and optics, hapetushuuhtelu may serve as a pretreatment to improve coating uniformity or to remove residues left by prior steps. In English-language sources, the term hapetushuuhtelu is rarely used; the concept is described more generally as oxidative cleaning or oxidative pretreatment.

Safety and environmental considerations are important: oxidizing agents can be reactive and hazardous, and waste streams require appropriate treatment. Process parameters should be validated for each material to minimize substrate damage.