Fotolitográfiai

Fotolitográfiai, often shortened to photolithography, is a process used in photolithographic printing and semiconductor fabrication. It involves using light to transfer a geometric pattern from a photomask to a light-sensitive chemical called a photoresist, or simply resist, on a substrate. This pattern is then etched onto the substrate.

In semiconductor manufacturing, photolithography is a critical step in creating integrated circuits, microprocessors, and other microelectronic components. It allows for the precise creation of intricate patterns on silicon wafers, which are then further processed to form the complex circuitry of modern chips. The process typically involves several stages, including cleaning the wafer, applying a uniform layer of photoresist, exposing the resist to light through a photomask, developing the exposed resist to reveal the pattern, and finally etching the substrate according to the developed pattern.

The resolution and accuracy of photolithography are paramount for the performance and density of semiconductor devices. Over time, advancements in light sources (such as deep ultraviolet, extreme ultraviolet) and mask technologies have enabled the creation of progressively smaller and more sophisticated features. Photolithography is also employed in other fields, such as the production of printed circuit boards and micro-electromechanical systems (MEMS). The principles of using light to define patterns are central to its application across these diverse areas.