Dünnfilmscanning

Dünnfilmscanning is a set of microscopy techniques used to analyze the surface structure, thickness, and composition of thin films deposited on substrates. The method relies on scanning a probe or a focused beam across the film surface while recording variations in signal, such as topographic height, electrical potential, or optical reflectance. A common implementation is atomic force microscopy (AFM), which maps surface roughness with nanometer resolution. Scanning electron microscopy (SEM) combined with energy-dispersive X-ray spectroscopy (EDS) provides compositional data. Spectroscopic ellipsometry relies on reflected light to deduce film thickness and optical constants, and can be performed in a scanning manner for spatial mapping.

Thin–film scanning is essential in characterizing semiconductor devices, protective coatings, and optical films. It enables the detection of defects such as pinholes or delamination, assessment of uniformity across large wafers, and measurement of adhesion strength. Tools such as scanning probe microscopes can operate in high-vacuum or in situ environments to monitor film growth during deposition processes. Challenges include maintaining tip–sample interactions without damaging delicate films, mitigating drift in long scans, and separating intrinsic material contrast from surface contamination. Despite these difficulties, Dünnfilmscanning remains a cornerstone of materials science, providing detailed, localized information that guides both research and industrial production of thin-film technologies.