Dünnfilme

Dünnfilme are thin layers of material deposited onto a substrate. Their thickness typically ranges from nanometers to a few micrometers. These films can be metallic, insulating, semiconducting, or a combination of these, and their properties are often distinct from the bulk material due to quantum mechanical effects and surface-to-volume ratios.

The fabrication of dünnfilme involves various techniques, broadly categorized into physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD methods include sputtering, where atoms or molecules are ejected from a target material and deposited onto the substrate, and evaporation, where the source material is vaporized and then condensed. CVD processes involve chemical reactions of gaseous precursors on the substrate surface, leading to the formation of a solid film. Other methods like molecular beam epitaxy (MBE) allow for atomic-level control over film growth.

Dünnfilme find widespread applications across numerous technological fields. In electronics, they are crucial components in integrated circuits, transistors, capacitors, and resistors. In optics, they are used for anti-reflective coatings, filters, and mirrors. The energy sector utilizes them in solar cells, batteries, and fuel cells. Furthermore, dünnfilme play a role in protective coatings, magnetic storage media, and biomedical devices. The precise control over their composition, structure, and thickness allows for tailored functionalities to meet specific application requirements.