BinärPhasenmasken

BinärPhasenmasken, also known as binary phase masks, are optical elements designed to modulate the phase of incident light in a binary manner. This means that the mask imparts one of two distinct phase shifts to the light that passes through it, typically 0 and pi radians (or 0 and 180 degrees). This binary phase modulation is achieved by creating regions of differing optical path length on the surface of the mask. These regions are usually fabricated using photolithography and etching techniques on transparent substrates like glass or fused silica.

The primary function of a binärPhasenmaske is to alter the wavefront of light in a controlled way. By precisely defining the pattern of these phase shifts, complex light distributions can be generated. This makes them valuable tools in various optical applications. For instance, they can be used to create specific focal spots, generate optical vortices, or split a beam into multiple identical beams. Their ability to perform complex beam shaping in a single optical element makes them an attractive alternative to combinations of conventional refractive and diffractive optics.

Applications of binärPhasenmasken are diverse. They are employed in optical trapping and manipulation of microscopic particles, where precise control over the light field is crucial for positioning and moving objects. In microscopy, they can be used to improve resolution or create specialized illumination patterns. Furthermore, binärPhasenmasken find use in optical interconnects for parallel data processing and in laser micromachining for creating intricate patterns. The design and fabrication of these masks are key to their performance, with intricate patterns requiring high-resolution manufacturing processes.