xSiO2

xSiO2 refers to amorphous silicon dioxide, a form of silica lacking a crystalline structure. Unlike crystalline polymorphs of silicon dioxide such as quartz, cristobalite, or tridymite, xSiO2 possesses a disordered arrangement of silicon and oxygen atoms. This amorphous nature results from rapid cooling or specific formation processes that prevent the regular atomic lattice from developing.

Commonly found in nature as naturally occurring volcanic glass (obsidian) or formed during certain geological processes, xSiO2 is also extensively produced synthetically for various technological applications. Its properties, such as high purity, good dielectric strength, and a tunable refractive index, make it valuable.

The production of synthetic xSiO2 often involves techniques like plasma-enhanced chemical vapor deposition (PECVD) or sol-gel methods. These processes allow for control over the material's density, porosity, and surface chemistry. Applications span from microelectronics, where it is used as an insulator in semiconductor devices, to optical fibers, where it forms the core and cladding. It is also utilized in chromatography, as a component in specialty glasses, and as a filler material in polymers. The specific properties and performance of xSiO2 can vary depending on its method of preparation and post-processing.