oksüdikiht

Oksüdikiht, or oxide layer, is a thin film of oxide that forms on a material’s surface as a result of chemical oxidation. The layer can be crystalline or amorphous and its thickness ranges from a few nanometers to several micrometers, depending on the material and exposure conditions. Oxide layers may be protective, slowing further oxidation, or they may be porous or unstable, allowing continued reaction with the environment.

Formation and growth of an oksüdikiht occur when the surface reacts with oxygen or other oxidants. The kinetics are influenced by temperature, oxygen partial pressure, humidity, impurities, and alloying elements. In many cases, oxide growth is diffusion-limited and follows a parabolic rate law at elevated temperatures. The structure and adherence of the layer determine its protective quality: a dense, adherent film can act as a passivation layer, whereas a porous or cracked layer may accelerate corrosion.

Common materials that form functional oksüdikihts include aluminum (alumina, Al2O3), chromium-containing stainless steels (chromia, Cr2O3), titanium (titania, TiO2), silicon (silica, SiO2), and copper (copper oxides). In electronics, native oxide layers on semiconductors are crucial for insulation and native-passivation properties. In high-temperature environments, oxide scales protect underlying substrates but can spall or grow excessively, affecting integrity.

Analytical methods used to study oksüdikihts include X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy, ellipsometry, Raman spectroscopy, and microscopy techniques. Understanding the oxide layer is essential for corrosion prevention, materials design, and surface engineering.