mikrolitográfiában

Mikrolitográfia, also known as microlithography, is a process used in the fabrication of microelectronic circuits and other micro-scale devices. It involves the transfer of a geometric pattern from a mask to a light-sensitive chemical called a photoresist, typically on a substrate such as a silicon wafer. This patterned photoresist then acts as a mask for subsequent processing steps like etching or deposition.

The most common form of microlithography is photolithography, which uses light, usually ultraviolet (UV) light, to expose the photoresist. The process begins with a photomask, which contains the desired circuit pattern. This mask is placed between a light source and the photoresist-covered substrate. When light passes through the transparent areas of the mask, it causes a chemical change in the exposed photoresist.

After exposure, the photoresist is developed, removing either the exposed or unexposed areas, depending on whether it is a positive or negative photoresist. The remaining photoresist pattern then protects certain areas of the substrate during subsequent manufacturing steps. For instance, in etching, the unprotected areas are removed. In deposition, material is added to the unprotected areas.

Advancements in microlithography have been crucial for the continuous miniaturization of electronic components, following Moore's Law. Techniques like deep ultraviolet (DUV) lithography and extreme ultraviolet (EUV) lithography have enabled the creation of ever smaller and more intricate features. Beyond semiconductors, microlithography finds applications in micro-optics, MEMS (micro-electro-mechanical systems), and the creation of microfluidic devices.