gasfasdeposition
Gas-phase deposition is a family of thin-film fabrication methods in which material is delivered to a substrate from a gas or vapor. It is distinguished from liquid- or solid-phase deposition by the transport and reaction of gaseous precursors, often under reduced pressure or in a controlled atmosphere. The techniques are used to produce coatings and layered structures with a wide range of materials and properties.
The main categories are chemical vapor deposition (CVD) and physical vapor deposition (PVD). In CVD, volatile
Process parameters such as substrate temperature, chamber pressure, gas flow, and reactor design determine deposition rate,